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A working manual for design and process engineers, this book offers analytical solutions and process optimization for impurity diffusion in silicon, gallium arsenide, and other semiconductor materials used in the fabrication of microelectronics devices and microsystems.
A working manual for design and process engineers, this book offers analytical solutions and process optimization for impurity diffusion in silicon, gallium arsenide, and other semiconductor materials used in the fabrication of microelectronics devices and microsystems.
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This product has multiple variants. The options may be chosen on the product page